[1]Cheng Xu, Dawei Li, Heliang Fan, Jianxin Deng, Jianwei Qi, Peng Yi, Yinghuai Qiang, Effects of different post-treatment methods on optical properties, absorption and nanosecond laser-induced damage threshold of Ta2O5 films, Thin Solid Films, 2015, 580: 12-20.
[2]Cheng Xu, Dawei Li, Heliang Fan, Jianwei Qi, Jianxin Deng, Shuai Yang, Peng Yi, Yinghuai Qiang, Laser-induced damage of Ta2O5 films obtained from TaCl5 precursor and annealed at different temperatures, Appl. Surf. Sci., 2015,344:137-145.
[3]Cheng Xu, Di Lin, Jinan Niu, Yinghuai Qiang, Dawei Li, Chunxian Tao, Preparation of Ta-doped TiO2 using Ta2O5 as the doping source, Chin. Phys. Lett., 2015, 32: 088102.
[4]Cheng Xu, Heliang Fan, Dawei Li, Jianwei Qi, Shuai Yang, Yinghuai Qiang, Comparative studies on the laser-induced damage of TiO2 films with different additives and thickness, Optik, 2015, 126: 5478-5482.
[5]Cheng Xu, Ming Ma, Huanhuan Sun, Di Lin, Peizhong Feng, Jianwei Qi, Yinghuai Qiang, Dawei Li, Chunxian Tao, Study on the relationship between laser-induced damage threshold and microscopic properties of Ta2O5 films by the combination of experiment and simulation, Optoelectron. Adv. Mat., 2015, 9: 1337-1341.
[6]Cheng Xu, Di Lin, Peizhong Feng, Dawei Li, Heliang Fan, Jianwei Qi, Jinan Niu, Yinghuai Qiang, Influencing factors in the laser-induced damage threshold of Ta2O5 films prepared with different methods, J. Optoelectron. Adv. M., 2015, 17: 1739-1746.
[7]Cheng Xu, Jiaojiao Jia, Di Yang, Heliang Fan, Yinghuai Qiang, Jiongtian Liu, Guohang Hu, Dawei Li, Nanosecond laser-induced damage at different initial temperatures of Ta2O5 films prepared by dual ion beam sputtering, J. Appl. Phys., 2014, 116: 053102.
[16] Cheng Xu, Linmin Xu, Hanzhuo Zhang, Yinghuai Qiang, Yabo Zhu, Jiongtian Liu, Jianda Shao, Comparative studies on the laser damage resistance of Ta2O5 and Nb2O5 films performed under different electron beam currents, Chin. Phys. Lett., 2011, 28: 064211.
[17] Cheng Xu, Yulong Zhao, Yinghuai Qiang, Yabo Zhu, Litong Guo, Jianda Shao, Comparison of laser-induced damage in Ta2O5 and Nb2O5 single-layer films and high reflectors, Chin. Opt. Lett., 2011, 9: 013102.
[18] Cheng Xu, Yinghuai Qiang, Yabo Zhu, Tingting Zhai, Litong Guo, Yulong Zhao, Jianda Shao, Zhengxiu Fan, Laser-induced damage threshold at different wavelengths of Ta2O5 films annealed over a wide temperature range, Vacuum, 2010, 84: 1310-1314.
[19] Cheng Xu, Yinghuai Qiang, Yabo Zhu, Litong Guo, Jianda Shao, Zhengxiu Fan, Laser damage mechanisms of amorphous Ta2O5 films at 1064, 532 and 355 nm in 1-on-1 regime, Chin. Phys. Lett., 2010, 27: 114205.
[20] Cheng Xu, Yinghuai Qiang, Yabo Zhu, Jianda Shao, Zhengxiu Fan, Jinhong Han, Effects of deposition parameters on laser-induced damage threshold of Ta2O5 films, Opt. Laser Technol., 2010, 42: 497-502.
[21] Cheng Xu, Hongcheng Dong, Lei Yuan, Hongbo He, Jianda Shao, Zhengxiu Fan, Investigation of annealing effects on the laser-induced damage threshold of amorphous Ta2O5 films, Opt. Laser Technol., 2009, 41: 258-263.
[22] Cheng Xu, Yinghuai Qiang, Yabo Zhu, Jianda Shao, Zhengxiu Fan, Laser-induced damage threshold at different wavelengths of Ta2O5 films of wide-range temperature annealing, J. Optoelectron. Adv. M., 2009, 11: 863-869.
[23] Cheng Xu, Qiling Xiao, Jianyong Ma, Yunxia Jin, Jianda Shao, Zhengxiu Fan, High temperature annealing effect on structure, optical property and laser-induced damage threshold of Ta2O5 films, Appl. Surf. Sci., 2008, 254: 6554-6559.
[24] Cheng Xu, Jianyong Ma, Yunxia Jin, Hongbo He, Jianda Shao, Zhengxiu Fan, Influence of different substrates on laser induced damage thresholds at 1064 nm of Ta2O5 films, Chin. Phys. Lett., 2008, 25: 1321-1324.
[25] Cheng Xu, Xiao Li, Hongcheng Dong, Yunxia Jin, Jianda Shao, Zhengxiu Fan, Laser induced damage threshold at 355 and 1064 nm of Ta2O5 films of different phases, Chin. Phys. Lett., 2008, 25: 3300-3303.
[26] Cheng Xu, Dawei Li, Jianyong Ma, Yunxia Jin, Jianda Shao, Zhengxiu Fan, Influence of SiO2 additional layers on the laser induced damage threshold of Ta2O5 films, Opt. Laser Technol., 2008, 40: 545-549.
[27] Cheng Xu, Hongcheng Dong, Jianyong Ma, Yunxia Jin, Jianda Shao, Zhengxiu Fan, Influences of SiO2 protective layers and annealing on the laser-induced damage threshold of Ta2O5 films, Chin. Opt. Lett., 2008, 6: 228-230.
[28] Cheng Xu, Jianke Yao, Jianyong Ma, Yunxia Jin, Jianda Shao, Laser-induced damage threshold in n-on-1 regime of Ta2O5 films at 532, 800 and 1064 nm, Chin. Opt. Lett., 2007, 12(5): 727-729.