中國礦業(yè)大學（徐州）

個人簡介

許程，男，1981年生，副教授。2003年獲武漢理工大學材料科學與工程專業(yè)學士學位，2006年獲武漢理工大學碩士學位，2009年獲中科院上海光學精密機械研究所博士學位。2013年美國佐治亞理工學院訪問學者。2014年入選江蘇省“青藍工程”優(yōu)秀青年骨干教師、中國礦業(yè)大學第八批校級青年學術(shù)帶頭人。2015年江蘇省“六大人才高峰”高層次人才、首批校優(yōu)秀拔尖教師海外訪問研究項目、中國礦業(yè)大學“英才培育工程”。從事激光薄膜、納米材料研究。主持國家自然科學基金、江蘇省自然科學基金面上項目、高等學校博士學科點專項科研基金新教師類資助課題、中國博士后科學基金面上資助項目、中國博士后科學基金特別資助項目各1項。以第一作者或通訊作者發(fā)表SCI論文28篇，授權(quán)國家發(fā)明專利10項，出版專著1部。Email:xucheng@cumt.edu.cn.

獲獎、榮譽稱號

江蘇省“青藍工程”優(yōu)秀青年骨干教師、江蘇省“六大人才高峰”高層次人才、中國礦業(yè)大學第八批青年學術(shù)帶頭人、優(yōu)秀班主任。

研究領(lǐng)域

光學薄膜、納米材料

科研項目

[1]國家自然科學青年基金項目，“氧化鉭薄膜激光損傷的溫度效應(yīng)及機理研究（61107080）”，2012.01-2014.12。

[2]江蘇省自然科學基金面上項目，江蘇省科技廳，2011.07-2014.07。

[3]江蘇省“青藍工程”優(yōu)秀青年骨干教師，人才項目，2014年。

[4]江蘇省“六大人才高峰”高層次人才培養(yǎng)對象，人才項目，2015年。

發(fā)表論文

[1]Cheng Xu, Dawei Li, Heliang Fan, Jianxin Deng, Jianwei Qi, Peng Yi, Yinghuai Qiang, Effects of different post-treatment methods on optical properties, absorption and nanosecond laser-induced damage threshold of Ta2O5 films, Thin Solid Films, 2015, 580: 12-20.

[2]Cheng Xu, Dawei Li, Heliang Fan, Jianwei Qi, Jianxin Deng, Shuai Yang, Peng Yi, Yinghuai Qiang, Laser-induced damage of Ta2O5 films obtained from TaCl5 precursor and annealed at different temperatures, Appl. Surf. Sci., 2015，344：137-145.

[3]Cheng Xu, Di Lin, Jinan Niu, Yinghuai Qiang, Dawei Li, Chunxian Tao, Preparation of Ta-doped TiO2 using Ta2O5 as the doping source, Chin. Phys. Lett., 2015, 32: 088102.

[4]Cheng Xu, Heliang Fan, Dawei Li, Jianwei Qi, Shuai Yang, Yinghuai Qiang, Comparative studies on the laser-induced damage of TiO2 films with different additives and thickness, Optik, 2015, 126: 5478-5482.

[5]Cheng Xu, Ming Ma, Huanhuan Sun, Di Lin, Peizhong Feng, Jianwei Qi, Yinghuai Qiang, Dawei Li, Chunxian Tao, Study on the relationship between laser-induced damage threshold and microscopic properties of Ta2O5 films by the combination of experiment and simulation, Optoelectron. Adv. Mat., 2015, 9: 1337-1341.

[6]Cheng Xu, Di Lin, Peizhong Feng, Dawei Li, Heliang Fan, Jianwei Qi, Jinan Niu, Yinghuai Qiang, Influencing factors in the laser-induced damage threshold of Ta2O5 films prepared with different methods, J. Optoelectron. Adv. M., 2015, 17: 1739-1746.

[7]Cheng Xu, Jiaojiao Jia, Di Yang, Heliang Fan, Yinghuai Qiang, Jiongtian Liu, Guohang Hu, Dawei Li, Nanosecond laser-induced damage at different initial temperatures of Ta2O5 films prepared by dual ion beam sputtering, J. Appl. Phys., 2014, 116: 053102.

[8]Cheng Xu, Peng Yi, Heliang Fan, Jianwei Qi, Shuai Yang, Yinghuai Qiang, Jiongtian Liu, Dawei Li, Preparation of high laser-induced damage threshold Ta2O5 films, Appl. Surf. Sci., 2014, 309: 194-199.

[9]Cheng Xu, Peng Yi, Heliang Fan, Jianwei Qi, Yinghuai Qiang, Jiongtian Liu, Chunxian Tao, Dawei Li, Correlations between the oxygen deficiency and the laser damage resistance of different oxide films, Appl. Surf. Sci., 2014, 289: 141-144.

[10]Cheng Xu, Shuai Yang, Zheng Wang, Jianxin Deng, Yulong Zhao, Heliang Fan, Yinghuai Qiang, Dawei Li, Laser-induced damage threshold of TiO2 films with different preparation methods and annealing temperatures, Chin. Phys. Lett., 2014, 31: 074207.

[11]Cheng Xu, Shuai Yang, Yinghuai Qiang, Jiongtian Liu, Jianyong Ma, Wide band polarization independent reflector based on guided mode resonance effect in three-level silicon-based element, Opt. Laser Technol., 2013, 45: 42-45.

[12]Cheng Xu, Shuai Yang, Yinghuai Qiang, Jiongtian Liu, Jianyong Ma, Wide band polarization independent reflector based on guided mode resonance effect in germanium grating, Optik, 2013, 124: 3033-3035.

[13]Cheng Xu, Shuai Yang, Shenghui Zhang, Jinan Liu, Yinghuai Qiang, Jiongtian Liu, Dawei Li, Temperature dependence of optical properties, chemical composition, structure and laser damage in Ta2O5 films, Chin. Phys. B, 2012, 21: 114213.

[14] Cheng Xu, Shuai Yang, Jifei Wang, Jinan Liu, Hao Ma, Yinghuai Qiang, Jiongtian Liu, Dawei Li, Chunxian Tao, Effect of oxygen vacancy on the band gap and nanosecond laser-induced damage threshold of Ta2O5 films, Chin. Phys. Lett., 2012, 29: 084207.

[15] Cheng Xu, Linmin Xu, Yinghuai Qiang, Yabo Zhu, Jiongtian Liu, Jianyong Ma, Excellent polarization independent reflector based on guided mode resonance effect, Chin. Phys. B, 2011, 20: 104210.

[16] Cheng Xu, Linmin Xu, Hanzhuo Zhang, Yinghuai Qiang, Yabo Zhu, Jiongtian Liu, Jianda Shao, Comparative studies on the laser damage resistance of Ta2O5 and Nb2O5 films performed under different electron beam currents, Chin. Phys. Lett., 2011, 28: 064211.

[17] Cheng Xu, Yulong Zhao, Yinghuai Qiang, Yabo Zhu, Litong Guo, Jianda Shao, Comparison of laser-induced damage in Ta2O5 and Nb2O5 single-layer films and high reflectors, Chin. Opt. Lett., 2011, 9: 013102.

[18] Cheng Xu, Yinghuai Qiang, Yabo Zhu, Tingting Zhai, Litong Guo, Yulong Zhao, Jianda Shao, Zhengxiu Fan, Laser-induced damage threshold at different wavelengths of Ta2O5 films annealed over a wide temperature range, Vacuum, 2010, 84: 1310-1314.

[19] Cheng Xu, Yinghuai Qiang, Yabo Zhu, Litong Guo, Jianda Shao, Zhengxiu Fan, Laser damage mechanisms of amorphous Ta2O5 films at 1064, 532 and 355 nm in 1-on-1 regime, Chin. Phys. Lett., 2010, 27: 114205.

[20] Cheng Xu, Yinghuai Qiang, Yabo Zhu, Jianda Shao, Zhengxiu Fan, Jinhong Han, Effects of deposition parameters on laser-induced damage threshold of Ta2O5 films, Opt. Laser Technol., 2010, 42: 497-502.

[21] Cheng Xu, Hongcheng Dong, Lei Yuan, Hongbo He, Jianda Shao, Zhengxiu Fan, Investigation of annealing effects on the laser-induced damage threshold of amorphous Ta2O5 films, Opt. Laser Technol., 2009, 41: 258-263.

[22] Cheng Xu, Yinghuai Qiang, Yabo Zhu, Jianda Shao, Zhengxiu Fan, Laser-induced damage threshold at different wavelengths of Ta2O5 films of wide-range temperature annealing, J. Optoelectron. Adv. M., 2009, 11: 863-869.

[23] Cheng Xu, Qiling Xiao, Jianyong Ma, Yunxia Jin, Jianda Shao, Zhengxiu Fan, High temperature annealing effect on structure, optical property and laser-induced damage threshold of Ta2O5 films, Appl. Surf. Sci., 2008, 254: 6554-6559.

[24] Cheng Xu, Jianyong Ma, Yunxia Jin, Hongbo He, Jianda Shao, Zhengxiu Fan, Influence of different substrates on laser induced damage thresholds at 1064 nm of Ta2O5 films, Chin. Phys. Lett., 2008, 25: 1321-1324.

[25] Cheng Xu, Xiao Li, Hongcheng Dong, Yunxia Jin, Jianda Shao, Zhengxiu Fan, Laser induced damage threshold at 355 and 1064 nm of Ta2O5 films of different phases, Chin. Phys. Lett., 2008, 25: 3300-3303.

[26] Cheng Xu, Dawei Li, Jianyong Ma, Yunxia Jin, Jianda Shao, Zhengxiu Fan, Influence of SiO2 additional layers on the laser induced damage threshold of Ta2O5 films, Opt. Laser Technol., 2008, 40: 545-549.

[27] Cheng Xu, Hongcheng Dong, Jianyong Ma, Yunxia Jin, Jianda Shao, Zhengxiu Fan, Influences of SiO2 protective layers and annealing on the laser-induced damage threshold of Ta2O5 films, Chin. Opt. Lett., 2008, 6: 228-230.

[28] Cheng Xu, Jianke Yao, Jianyong Ma, Yunxia Jin, Jianda Shao, Laser-induced damage threshold in n-on-1 regime of Ta2O5 films at 532, 800 and 1064 nm, Chin. Opt. Lett., 2007, 12(5): 727-729.

科研創(chuàng)新

[1]許程，楊帥，馬浩，王吉飛，郭立童，張含卓，尹詩斌，李大偉，強穎懷，劉炯天，高溫環(huán)境下具有高激光損傷閾值氧化鉭薄膜的制備方法，中國發(fā)明專利，申請?zhí)枺?01210084926.4。公開號：CN102605333A，專利授權(quán)號：ZL201210084926.4。 (授權(quán)公告日：2013.11.27)

[2]許程，楊帥，義鵬，郭立童，張含卓，尹詩斌，李大偉，強穎懷，劉炯天，高溫環(huán)境下激光輻照光學薄膜損傷閾值測量裝置和方法，中國發(fā)明專利，申請?zhí)枺?01210079348.5。公開號：CN102608019A。

[3]許程，楊帥，義鵬，郭立童，張含卓，尹詩斌，李大偉，強穎懷，劉炯天，高溫環(huán)境下激光輻照光學薄膜損傷閾值測量裝置，實用新型專利，申請?zhí)枺?01220113289.4，公開號：CN202502035U，專利授權(quán)號：ZL201220113289.4。(授權(quán)公告日：2012.10.24)

[4]許程，強穎懷，劉炯天，太陽能電池光陽極用二氧化鈦基納米晶的低溫合成方法，中國發(fā)明專利，申請?zhí)枺?01110178007.9。公開號：CN102275985A，專利授權(quán)號：ZL201110178007.9。(授權(quán)公告日：2013.7.3)

[5]許程，強穎懷，鐘耀東，李玲玲，韓慧，陳眾，劉炯天，低溫兩步法制備復(fù)合銳鈦礦型二氧化鈦可見光催化劑，中國發(fā)明專利，申請?zhí)枺?01110282801.8，公開號：CN102500426A，專利授權(quán)號：ZL201110282801.8。(授權(quán)公告日：2013.8.21)

[6]許程，強穎懷，朱亞波，張生輝，鐘耀東，許林敏，劉炯天，微波輔助反應(yīng)增壓法低溫制備摻雜型晶態(tài)二氧化鈦光電極，中國發(fā)明專利，申請?zhí)枺?01110282777.8。公開號：CN102354605A，專利授權(quán)號：ZL20111028277.8。(授權(quán)公告日：2013.4.3)

[7]強穎懷，許程，范賀良，陳眾，王吉飛，李玲玲，韓慧，一種柔性基底太陽能電池光電極的低溫制備方法，中國發(fā)明專利，申請?zhí)枺?01110330855.7。公開號：CN102509621A，專利授權(quán)號：ZL201110330855.7。

教學活動

主講《薄膜材料與技術(shù)》等課程。

指導學生情況

先后指導4名碩士研究生，其中2名已順利畢業(yè)。