武漢理工大學

姓 名

史蹟

性 別

男

民 族

漢

出生年月

 1963.06      

職  稱

教授

職 務

聯(lián)系電話

單位名稱

新材所

Email

Shi.j.aa@m.titech.ac.jp

實驗室網(wǎng)址

http://fct.group.whut.edu.cn/cn/index.html

研究方向

l  功能薄膜與涂層

l  金屬物理

l  物理氣相沉積

l  無機非金屬材料

教育背景

l  1994/4-1997/3，（日本）東京工業(yè)大學，金屬工學專攻，博士（工學）

l  1984/9-1987/6，哈爾濱工業(yè)大學，金屬材料科學與工程系，工學碩士

l  1980/9-1984/6，大連工學院，機械工程系，本科，工學學士

工作經(jīng)歷

l  2002/4-至今，東京工業(yè)大學，材料工學專攻   助教，副教授，教授

l  1997/4-2002/3，國立電氣通訊大學，量子物質(zhì)工學科，助教

l  1988/10-1993/9，蘭州大學，材料科學系，講師

l  1987/9-1988/9，蘭州大學，物理系，助教

項目情況

 

代表性學術
成果

1.       Hongyu An, Susumu Takada, Takumi Sannomiya, Shinji Muraishi, Ji Shi*, Yoshio Nakamura, Effect of substrate temperature on the magnetic properties and internal stresses of CoPt/AlN multilayer deposited by dc magnetron sputtering, Appl Phys A 113, 31 (2013).

2.      J. Wang, T. Omi, T. Sannomiya, S. Muraishi, J. Shi*, and Y. Nakamura, Strong perpendicular exchange bias in sputter-deposited CoPt/CoO multilayers, Applied Physics Letters 103, 042401 (2013).

3.      J. Wang, T. Sannomiya, J. Shi*, and Y. Nakamura, Perpendicular magnetic anisotropy and perpendicular exchange bias insputter-deposited CoO/CoPt multilayer, J. Appl. Phys. 113, 17D714 (2013).

4.      J. Wang, T. Sannomiya, J. Shi*, and Y. Nakamura, Influence of interface roughness on the exchange bias of Co/CoO multilayers, Journal of Applied Physics, 113, 17D707 (2013).

5.      Yuichiro Ikenoya, Masahiro Susa,  Ji Shi, Yoshio Nakamura, Andreas B. Dahlin, and Takumi Sannomiya, Optical Resonances in Short-Range Ordered Nanoholes in Ultrathin Aluminum/Aluminum Nitride Multilayers, The Journal of Physical Chemistry C，117，6373 (2013).

6.      T. Harumoto, T. Sannomiya, Y. Matsukawa, S. Muraishi,  J. Shi ,Y. Nakamura, H. Sawada, T. Tanaka, Y. Tanishiro, and K. Takayanagi, Controlled polarity of sputter-deposited aluminum nitride on metals observed by aberration corrected scanning transmission electron microscopy, Journal of Applied Physics, 113, 084306 (2013).

7.      Y. Yu, J. Shi*, and Y. Nakamura, Roles of interface roughness and internal stress in magneticanisotropy of CoPt/AlN multilayer films, Acta Materialia, 60, 6770 (2012).

8.      J. Wang, J. Shi* and Y. Nakamura, Interface roughness induced asymmetric magnetic property in sputterdeposited Co/CoO/Co exchange coupled trilayers, Journal of Applied Physics, 111, 07D725 (2012).

9.      Wupeng Cai,  Shinji, Muraishi , Ji Shi*, Yoshio Nakamura, Wei Liu, Ronghai Yu, Curie temperatures of CoPt ultrathin continuous films, Applied  Physics  A, 107, 519 (2012).

10.   Wupeng Cai, Shinji, Muraishi , Ji Shi*, Yoshio Nakamura, Wei Liu, Ronghai Yu, Spin reorientation transition in (111) textured L10 CoPt layers, Applied  Physics  A, 109, 69 (2012).